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A circuit design printed on a wafer using the scanning technique widely used in the semiconductor patterning process.

Semiconductor Manufacturing II

The THORS Semiconductor Manufacturing II course is designed to provide learners with a comprehensive understanding of the semiconductor patterning process, which is an important process for creating patterns on a microchip. Ready to take the next step? Explore the course details and see everything we’ve packed into this program!

Learning Hours: 1.5

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Course Description

Semiconductor manufacturing is a complex process involving many steps. The THORS Semiconductor Manufacturing II course focuses on the semiconductor patterning process. Information on photoresist application, use of reticles, different lithography techniques, and advanced methods of patterning are covered in this course. To enhance the learning experience, the course contains interactive quizzes that allow learners to test their knowledge and retention of the visually engaging content.

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Who will benefit from this semiconductor patterning process course?

Quality, manufacturing, engineering, design, testing, purchasing, and sales functions at organizations that require an understanding of how semiconductor devices are manufactured.

THORS uses Bloom’s Taxonomy Methodology for our course development

Certificate Awarded for Semiconductor Manufacturing II

Example of certificate awarded upon successful completion of the course.

*upon successful completion

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Learning Objectives

  1. Describe the various steps involved in the pre-patterning process.
  2. Identify the various types of lithography techniques and their applications.
  3. Recognize the various types of pattern printing techniques employed in the semiconductor industry.
  4. Explain the importance of post-exposure processes.
  5. Define the different advanced methods of patterning and their advantages.
Dense patterns created on a semiconductor chip using litho etch litho etch semiconductor double patterning process.
Semiconductor Manufacturing II THORS Academy course image

Table of Contents

  1. Pre-Patterning Processes
    1. Photoresist
      1. Photoresist Chemistry
      2. Equipment
      3. Photoresist Baking
    2. Reticle
  2. Photolithography
    1. Lithography Techniques
      1. Optical Lithography
        1. Extreme Ultraviolet (EUV) Lithography
        2. Deep Ultraviolet (DUV) Lithography
        3. Immersion Lithography
      2. Emerging Lithography
        1. Nanoimprint Lithography
        2. Other Emerging Lithography
    2. Pattern Printing Techniques
      1. Shadow Printing
      2. Projection Printing
        1. Stepping
        2. Scanning
        3. Step and Scan
        4. Direct Write
    3. Post-Exposure Processes
      1. Post-Exposure Bake (PEB)
      2. Development
    4. Advanced Methods of Patterning
      1. Double Patterning
        1. Litho Etch Litho Etch (LELE)
        2. Self-Aligned Double Patterning (SADP)
      2. Triple Patterning

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