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Chemical mechanical polishing, a semiconductor manufacturing process, to create smooth wafer surfaces.

Semiconductor Manufacturing III

The THORS Semiconductor Manufacturing III course is designed to provide learners with a comprehensive understanding of etching, ion implantation, and thermal processing involved in semiconductor manufacturing. Ready to take the next step? Explore the course details and see everything we’ve packed into this program!

Learning Hours: 2

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Course Description

Semiconductor manufacturing involves complex processes and multiple techniques. The THORS Semiconductor Manufacturing III course explores several crucial processes, including etching, ion implantation, and thermal processing. It provides information on different etching and cleaning techniques for etching diverse materials. The course also covers the ion implantation process, various types of implanters, and thermal processing. Interactive quizzes are incorporated into the course to enhance the learning journey, enabling learners to assess their comprehension and retention of visually stimulating content.

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Who will benefit from this semiconductor manufacturing process course?

Quality, manufacturing, engineering, design, testing, purchasing, and sales functions at organizations that require an understanding of how semiconductor devices are manufactured.

THORS uses Bloom’s Taxonomy Methodology for our course development

Certificate Awarded for Semiconductor Manufacturing III

Example of certificate awarded upon successful completion of the course.

*upon successful completion

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Learning Objectives

  1. Recognize the importance of wet cleaning and wafer drying techniques.
  2. Define the different chemistries used to wet etch different materials.
  3. Distinguish between the wet etching and dry etching techniques.
  4. Identify the significance of Chemical Mechanical Polishing (CMP).
  5. Describe the ion implantation process, different types of implanters, and their applications.
  6. Explain the processes involved in thermal processing, such as oxidation, annealing, and diffusion.
  7. Understand how silicide is formed.
A wafer is heated in a vapor dryer to remove solvent, which is a necessary semiconductor manufacturing process.
Semiconductor Manufacturing III THORS course image

Table of Contents

  1. Semiconductor Etching
    1. Wet Processing
      1. Wet Etching
        1. Dielectrics
        2. Conductors
      2. Wet Mask Strip
      3. Lift-Off
      4. Wet Cleaning
        1. Chemistries
          1. Procedures between Process Steps
          2. Premanufacturing Procedures
            1. Radio Corporation of America (RCA) Cleaning
            2. Solvent Cleaning
          3. Approaches
      5. Wafer Drying
        1. Spin Drying
        2. Vapor Drying
    2. Dry Etching
      1. Types
        1. Isotropic Dry Etching
        2. Anisotropic Dry Etching
        3. Reactive Ion Etching (RIE)
      2. Materials
        1. Dielectrics
        2. Conductors
        3. Photoresist
    3. Chemical Mechanical Polishing (CMP)
  2. p-n Junction Formation
    1. Ion Implantation
      1. Process
      2. Types of Ion Implanters
        1. High Current Implanter
        2. Medium Current Implanter
        3. High Energy Implanter
        4. Plasma Implanter
    2. Thermal Processing
      1. Oxidation
      2. Annealing
      3. Diffusion
      4. Silicide Formation

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